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Properties of 3C-Si...
Properties of 3C-SiC Grown by Sublimation Epitaxy on Different Type of Substrates
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- Beshkova, Milena (author)
- Linköpings universitet,Halvledarmaterial,Tekniska högskolan
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- Lorenzzi, J. (author)
- UMR-CNRS
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- Jegenyes, N. (author)
- UMR-CNRS
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- Birch, Jens (author)
- Linköpings universitet,Tunnfilmsfysik,Tekniska högskolan
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- Syväjärvi, Mikael (author)
- Linköpings universitet,Halvledarmaterial,Tekniska högskolan
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- Ferro, G. (author)
- UMR-CNRS
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- Yakimova, Rositsa (author)
- Linköpings universitet,Halvledarmaterial,Tekniska högskolan
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(creator_code:org_t)
- Transtec Publications; 1999, 2010
- 2010
- English.
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In: Materials Science Forum, Vols. 645-648. - : Transtec Publications; 1999. ; , s. 183-186
- Related links:
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https://urn.kb.se/re...
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https://doi.org/10.4...
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Abstract
Subject headings
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- 3C-SiC layers have been grown by using sublimation epitaxy at a temperature of 2000 degrees C, on different types of on-axis 6H-SiC(0001) substrates. The influence of the type of substrate on the morphology of the layers investigated by Atomic Force Microscopy (AFM) is discussed. Stacking faults are studied by reciprocal space map (RSM) which shows that double positions domains exists.
Keyword
- 3C-SiC; Sublimation Epitaxy; morphology; AFM; HRXRD
- TECHNOLOGY
- TEKNIKVETENSKAP
Publication and Content Type
- ref (subject category)
- kon (subject category)
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