Growth of Hard Amorphous Ti-Al-Si-N Thin Films by Cathodic Arc Evaporation

Ti(1−x−y)AlxSiyNz (0.02≤x≤0.46, 0.02≤y≤0.28, and 1.08≤z≤1.29) thin films were grown on cemented carbide substrates in an industrial scale cathodic arc evaporation system using Ti-Al-Si compound cathodes in a N2 atmosphere. The microstructure of the as-deposited films changes from nanocrystalline to amorphous by addition of Al and Si to TiN. Upon incorporation of 12 at% Si and 18 at% Al, the films assume an x-ray amorphous state. Post-deposition anneals show that the films are thermally stable up to 900 ◦C. The films exhibit age hardening up to 1000 ◦C with an increase in hardness from 21.9 GPa for as-deposited films to 31.6 GPa at 1000 ◦C. At 1100 ◦C severe out-diffusion of Co and W from the substrate occur, and the films recrystallize into c-TiN and w-AlN.

Andersson, J. M.Seco Tools AB, SE-737 82 Fagersta, Sweden (author)
Johansson, MatsLinköpings universitet,Nanostrukturerade material,Tekniska högskolan(Swepub:liu)matjo02 (author)
Odén, MagnusLinköpings universitet,Nanostrukturerade material,Tekniska högskolan(Swepub:liu)magod41 (author)
Hultman, LarsLinköpings universitet,Tunnfilmsfysik,Tekniska högskolan(Swepub:liu)larhu75 (author)
Linköpings universitetTunnfilmsfysik (creator_code:org_t)

In:Surface & Coatings Technology: Elsevier BV235:25, s. 376-3850257-89721879-3347

By the author/editor: Fager, Hanna; Andersson, J. M.; Johansson, Mats; Odén, Magnus; Hultman, Lars

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