WFRF:(Fager Hanna)
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| Fältnamn | Indikatorer | Metadata |
|---|---|---|
| 000 | 02497naa a2200325 4500 | |
| 001 | oai:DiVA.org:liu-80199 | |
| 003 | SwePub | |
| 008 | 120822s2013 | |||||||||||000 ||eng| | |
| 024 | 7 | a https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-801992 URI |
| 024 | 7 | a https://doi.org/10.1016/j.surfcoat.2013.07.0142 DOI |
| 040 | a (SwePub)liu | |
| 041 | a engb eng | |
| 042 | 9 SwePub | |
| 072 | 7 | a ref2 swepub-contenttype |
| 072 | 7 | a art2 swepub-publicationtype |
| 100 | 1 | a Fager, Hannau Linköpings universitet,Tunnfilmsfysik,Tekniska högskolan4 aut0 (Swepub:liu)hanfa36 |
| 245 | 1 0 | a Growth of Hard Amorphous Ti-Al-Si-N Thin Films by Cathodic Arc Evaporation |
| 264 | 1 | b Elsevier BV,c 2013 |
| 338 | a electronic2 rdacarrier | |
| 520 | a Ti(1−x−y)AlxSiyNz (0.02≤x≤0.46, 0.02≤y≤0.28, and 1.08≤z≤1.29) thin films were grown on cemented carbide substrates in an industrial scale cathodic arc evaporation system using Ti-Al-Si compound cathodes in a N2 atmosphere. The microstructure of the as-deposited films changes from nanocrystalline to amorphous by addition of Al and Si to TiN. Upon incorporation of 12 at% Si and 18 at% Al, the films assume an x-ray amorphous state. Post-deposition anneals show that the films are thermally stable up to 900 ◦C. The films exhibit age hardening up to 1000 ◦C with an increase in hardness from 21.9 GPa for as-deposited films to 31.6 GPa at 1000 ◦C. At 1100 ◦C severe out-diffusion of Co and W from the substrate occur, and the films recrystallize into c-TiN and w-AlN. | |
| 700 | 1 | a Andersson, J. M.u Seco Tools AB, SE-737 82 Fagersta, Sweden4 aut |
| 700 | 1 | a Johansson, Matsu Linköpings universitet,Nanostrukturerade material,Tekniska högskolan4 aut0 (Swepub:liu)matjo02 |
| 700 | 1 | a Odén, Magnusu Linköpings universitet,Nanostrukturerade material,Tekniska högskolan4 aut0 (Swepub:liu)magod41 |
| 700 | 1 | a Hultman, Larsu Linköpings universitet,Tunnfilmsfysik,Tekniska högskolan4 aut0 (Swepub:liu)larhu75 |
| 710 | 2 | a Linköpings universitetb Tunnfilmsfysik4 org |
| 773 | 0 | t Surface & Coatings Technologyd : Elsevier BVg 235:25, s. 376-385q 235:25<376-385x 0257-8972x 1879-3347 |
| 856 | 4 | u https://liu.diva-portal.org/smash/get/diva2:546132/FULLTEXT01.pdfx primaryx Raw objecty fulltext:postprint |
| 856 | 4 | u http://liu.diva-portal.org/smash/get/diva2:546132/FULLTEXT01 |
| 856 | 4 8 | u https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-80199 |
| 856 | 4 8 | u https://doi.org/10.1016/j.surfcoat.2013.07.014 |
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