WFRF:(Wang Zhuyi)
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| Fältnamn | Indikatorer | Metadata |
|---|---|---|
| 000 | 03755naa a2200433 4500 | |
| 001 | oai:DiVA.org:uu-496840 | |
| 003 | SwePub | |
| 008 | 230223s2023 | |||||||||||000 ||eng| | |
| 024 | 7 | a https://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-4968402 URI |
| 024 | 7 | a https://doi.org/10.1002/sia.71602 DOI |
| 040 | a (SwePub)uu | |
| 041 | a engb eng | |
| 042 | 9 SwePub | |
| 072 | 7 | a ref2 swepub-contenttype |
| 072 | 7 | a art2 swepub-publicationtype |
| 100 | 1 | a Zhang, Meihongu Shanghai Univ, Res Ctr Nanosci & Nanotechnol, Shanghai 200444, Peoples R China.4 aut |
| 245 | 1 0 | a A simple and rapid route for synthesizing the nanosized g-C3N4 materials with narrow bandgap and their photocatalytic activity |
| 264 | c 2022-11-04 | |
| 264 | 1 | b John Wiley & Sons,c 2023 |
| 338 | a print2 rdacarrier | |
| 520 | a The graphitic carbon nitride (g-C3N4) materials with many intriguing properties have attracted much attention in photocatalysis. The photocatalytic activity of g-C3N4 is hindered by serious aggregation and limited exposed active sites. Herein is shown that nanosized g-C3N4 can be simply obtained by a superfast high-pressure homogenization approach. The high-pressure homogenization treatment can provide strong force to cut and/or to exfoliate the bulk g-C3N4 into nanosized g-C3N4 with good dispersion. Moreover, choosing different solvents during treatment can cause a different surface structure of as-prepared nanosized g-C3N4. In addition, the narrow bandgap properties, the high photogenerated charge carrier separation, and the transport abilities are achieved in as-prepared nanosized g-C3N4 because of the retaining conjugated C3N4 system. Specifically, the photocatalytic activities of as-prepared nanosized g-C3N4 have been significantly enhanced in terms of degradation of organic dye Rhodamine B (RhB) under visible light irradiation (10 times higher than that of bulk g-C3N4). These findings can provide a promising and simple approach to the exfoliation, nanonization, and surface functionalization of 2D layered materials. | |
| 650 | 7 | a NATURVETENSKAPx Kemix Fysikalisk kemi0 (SwePub)104022 hsv//swe |
| 650 | 7 | a NATURAL SCIENCESx Chemical Sciencesx Physical Chemistry0 (SwePub)104022 hsv//eng |
| 653 | a high-pressure homogenization | |
| 653 | a nanosized g-C3N4 | |
| 653 | a photocatalysis | |
| 653 | a surface structure | |
| 653 | a visible light absorption | |
| 700 | 1 | a Fang, Yuqianu Shanghai Univ, Res Ctr Nanosci & Nanotechnol, Shanghai 200444, Peoples R China.4 aut |
| 700 | 1 | a Yuan, Shuaiu Shanghai Univ, Res Ctr Nanosci & Nanotechnol, Shanghai 200444, Peoples R China.4 aut |
| 700 | 1 | a Shi, Liyiu Shanghai Univ, Res Ctr Nanosci & Nanotechnol, Shanghai 200444, Peoples R China.;Shanghai Univ, Emerging Ind Inst, Jiaxing, Zhejiang, Peoples R China.4 aut |
| 700 | 1 | a Wang, Zhuyiu Shanghai Univ, Res Ctr Nanosci & Nanotechnol, Shanghai 200444, Peoples R China.4 aut |
| 700 | 1 | a Wang, Yiu Shanghai Univ, Res Ctr Nanosci & Nanotechnol, Shanghai 200444, Peoples R China.4 aut |
| 700 | 1 | a Zhu, Jiefangu Uppsala universitet,Institutionen för kemi - Ångström4 aut0 (Swepub:uu)zhuji179 |
| 700 | 1 | a Zhao, Yinu Shanghai Univ, Res Ctr Nanosci & Nanotechnol, Shanghai 200444, Peoples R China.4 aut |
| 710 | 2 | a Shanghai Univ, Res Ctr Nanosci & Nanotechnol, Shanghai 200444, Peoples R China.b Shanghai Univ, Res Ctr Nanosci & Nanotechnol, Shanghai 200444, Peoples R China.;Shanghai Univ, Emerging Ind Inst, Jiaxing, Zhejiang, Peoples R China.4 org |
| 773 | 0 | t Surface and Interface Analysisd : John Wiley & Sonsg 55:1, s. 63-70q 55:1<63-70x 0142-2421x 1096-9918 |
| 856 | 4 8 | u https://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-496840 |
| 856 | 4 8 | u https://doi.org/10.1002/sia.7160 |
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