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Sökning: WFRF:(von Seggern J.) > Silicon fluxes in t...

LIBRIS Formathandbok  (Information om MARC21)
FältnamnIndikatorerMetadata
00003878naa a2200397 4500
001oai:DiVA.org:ltu-4453
003SwePub
008160929s1995 | |||||||||||000 ||eng|
024a https://urn.kb.se/resolve?urn=urn:nbn:se:ltu:diva-44532 URI
024a https://doi.org/10.1016/0022-3115(94)00535-42 DOI
040 a (SwePub)ltu
041 a engb eng
042 9 SwePub
072 7a ref2 swepub-contenttype
072 7a art2 swepub-publicationtype
100a Rubel, M.u Physics Department - Frescati, Royal Institute of Technology, Association EURATOM - NFR, S-104 05 Stockholm, Sweden4 aut
2451 0a Silicon fluxes in the scrape-off layer plasma during silicon-assisted operation of TEXTOR
264 1b Elsevier BV,c 1995
338 a print2 rdacarrier
500 a Godkänd; 1995; 20070409 (ysko)
520 a Surface collector probes were applied at TEXTOR for the investigation of silicon fluxes in the scrape-off layer during the first silicon-assisted (silane puffing, siliconization) operation of a tokamak. Probe exposures were made in order to measure the evolution of Si fluxes and the influence of silicon on the behaviour of other impurity fluxes like boron, oxygen and metals. Studies were performed under different conditions: heating mode, plasma density and gas filling. Comparative exposures were made before introduction of Si into the machine as well as immediately and long time after the siliconization. The exposed graphite samples were examined by surface analysis techniques, including Auger electron and Rutherford backscattering spectroscopies, nuclear reaction analysis and ultra-high resolution microscopies. The most important findings are concerned with: (i) the relation between silicon to carbon and silicon to oxygen in the deposits; (ii) the change in radial profiles of Si, B and D fluxes during consecutive stages of the silicon-assisted operation, and the retention of deuterium in the Si containing codeposited layers. The influence of plasma density on the fluxes is considered and gettering of oxygen by silicon is also addressed. Comparison is also made to the results of VUV spectroscopy signals of silicon and oxygen impurities in the plasma.
650 7a NATURVETENSKAPx Fysikx Annan fysik0 (SwePub)103992 hsv//swe
650 7a NATURAL SCIENCESx Physical Sciencesx Other Physics Topics0 (SwePub)103992 hsv//eng
653 a Fysik
653 a Physics
700a Wienhold, P.u Institute of Plasma Physics, Forschungszentrum Jülich, Association EURATOM - KFA, D-52425 Jülich, Germany4 aut
700a Almqvist, Nilsu Luleå tekniska universitet,Materialvetenskap4 aut0 (Swepub:ltu)nils
700a Emmoth, B.u Physics Department - Frescati, Royal Institute of Technology, Association EURATOM - NFR, S-104 05 Stockholm, Sweden4 aut
700a Esser, H.G.u Institute of Plasma Physics, Forschungszentrum Jülich, Association EURATOM - KFA, D-52425 Jülich, Germany4 aut
700a Könen, L.u Institute of Plasma Physics, Forschungszentrum Jülich, Association EURATOM - KFA, D-52425 Jülich, Germany4 aut
700a von Seggern, J.u Institute of Plasma Physics, Forschungszentrum Jülich, Association EURATOM - KFA, D-52425 Jülich, Germany4 aut
700a Winter, J.u Institute of Plasma Physics, Forschungszentrum Jülich, Association EURATOM - KFA, D-52425 Jülich, Germany4 aut
710a Physics Department - Frescati, Royal Institute of Technology, Association EURATOM - NFR, S-104 05 Stockholm, Swedenb Institute of Plasma Physics, Forschungszentrum Jülich, Association EURATOM - KFA, D-52425 Jülich, Germany4 org
773t Journal of Nuclear Materialsd : Elsevier BVg 220-222, s. 536-540q 220-222<536-540x 0022-3115x 1873-4820
8564 8u https://urn.kb.se/resolve?urn=urn:nbn:se:ltu:diva-4453
8564 8u https://doi.org/10.1016/0022-3115(94)00535-4

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