Absolute extreme ultraviolet yield from femtosecond-laser-excited Xe clusters

Ter-Avetisyan, S. (author)

Schnurer, M. (author)

Stiel, H. (author)

2001
2001
English.
In: Physical Review E. Statistical, Nonlinear, and Soft Matter Physics. - 1063-651X .- 1095-3787. ; 6403:3

Related links:: https://urn.kb.se/re...; show more...; https://doi.org/10.1...; show less...

Abstract Subject headings

Large Xe clusters (10(5)-10(6) atoms per cluster) have been irradiated with ultrashort (50 fs) and high-intensity (similar to2 x 10(18) W/cm(2)) pulses from a Ti:sapphire multi-TW laser at 800 nm wavelength. Scaling and absolute yield measurements of extreme ultraviolet (EUV) emission in a wavelength range between 7 and 15 nm in combination with cluster target characterization have been used for yield optimization. Maximum emission as a function of the backing pressure and a spatial emission anisotropy covering a factor of two at optimized yields is discussed with a simple model of the source geometry and EUV-radiation absorption. Circularly polarized laser light instead of linear polarization results in a factor of 2.5 higher emission in the 11 to 15 nm wavelength range. This indicates the initial influence of optical-field ionization for the interaction parameter range used and contrasts to collisional heating that seems to influence preferentially higher ionization. Absolute emission efficiency at 13.4 nm of up to 0.5% in 2 pi sr and 2.2% bandwidth has been obtained.

By the author/editor: Ter-Avetisyan, S ...; Schnurer, M.; Stiel, H.; Vogt, Ulrich; Radloff, W.; Karpov, W.; show more...; Sandner, W.; Nickles, P. V.; show less...

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