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Sökning: WFRF:(Xander P) > (2012) > Rapid manufacturing...

LIBRIS Formathandbok  (Information om MARC21)
FältnamnIndikatorerMetadata
00003713naa a2200361 4500
001oai:DiVA.org:liu-118820
003SwePub
008150604s2012 | |||||||||||000 ||eng|
024a https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-1188202 URI
024a https://doi.org/10.1088/0957-4484/23/47/4753022 DOI
040 a (SwePub)liu
041 a engb eng
042 9 SwePub
072 7a ref2 swepub-contenttype
072 7a art2 swepub-publicationtype
100a Janssen, Xander J. A.u Delft University of Technology, Netherlands4 aut
2451 0a Rapid manufacturing of low-noise membranes for nanopore sensors by trans-chip illumination lithography
264 c 2012-10-26
264 1b IOP Publishing: Hybrid Open Access,c 2012
338 a print2 rdacarrier
500 a Funding Agencies|Foundation for Fundamental Research on Matter (FOM); ERC project NANOforBIO; Wenner-Gren Foundations
520 a In recent years, the concept of nanopore sensing has matured from a proof-of-principle method to a widespread, versatile technique for the study of biomolecular properties and interactions. While traditional nanopore devices based on a nanopore in a single layer membrane supported on a silicon chip can be rapidly fabricated using standard microfabrication methods, chips with additional insulating layers beyond the membrane region can provide significantly lower noise levels, but at the expense of requiring more costly and time-consuming fabrication steps. Here we present a novel fabrication protocol that overcomes this issue by enabling rapid and reproducible manufacturing of low-noise membranes for nanopore experiments. The fabrication protocol, termed trans-chip illumination lithography, is based on illuminating a membrane-containing wafer from its backside such that a photoresist (applied on the wafers top side) is exposed exclusively in the membrane regions. Trans-chip illumination lithography permits the local modification of membrane regions and hence the fabrication of nanopore chips containing locally patterned insulating layers. This is achieved while maintaining a well-defined area containing a single thin membrane for nanopore drilling. The trans-chip illumination lithography method achieves this without relying on separate masks, thereby eliminating time-consuming alignment steps as well as the need for a mask aligner. Using the presented approach, we demonstrate rapid and reproducible fabrication of nanopore chips that contain small (12 mu m x 12 mu m) free-standing silicon nitride membranes surrounded by insulating layers. The electrical noise characteristics of these nanopore chips are shown to be superior to those of simpler designs without insulating layers and comparable in quality to more complex designs that are more challenging to fabricate.
650 7a NATURVETENSKAPx Biologix Biofysik0 (SwePub)106032 hsv//swe
650 7a NATURAL SCIENCESx Biological Sciencesx Biophysics0 (SwePub)106032 hsv//eng
700a Jonsson, Magnus P.u Delft University of Technology, Netherlands4 aut0 (Swepub:liu)magjo02
700a Plesa, Calinu Delft University of Technology, Netherlands4 aut
700a Soni, Gautam V.u Delft University of Technology, Netherlands4 aut
700a Dekker, Ceesu Delft University of Technology, Netherlands4 aut
700a Dekker, Nynke H.u Delft University of Technology, Netherlands4 aut
710a Delft University of Technology, Netherlands4 org
773t Nanotechnologyd : IOP Publishing: Hybrid Open Accessg 23:47q 23:47x 0957-4484x 1361-6528
8564 8u https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-118820
8564 8u https://doi.org/10.1088/0957-4484/23/47/475302

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