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LIBRIS Formathandbok  (Information om MARC21)
FältnamnIndikatorerMetadata
00002974naa a2200325 4500
001oai:DiVA.org:uu-186774
003SwePub
008121129s2013 | |||||||||||000 ||eng|
024a https://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-1867742 URI
024a https://doi.org/10.1088/0960-1317/23/10/1050012 DOI
040 a (SwePub)uu
041 a engb eng
042 9 SwePub
072 7a ref2 swepub-contenttype
072 7a art2 swepub-publicationtype
100a Palmer, Kristofferu Uppsala universitet,Mikrosystemteknik,ÅSTC4 aut0 (Swepub:uu)kripa149
2451 0a Investigation of exhausts from fabricated silicon micronozzles with rectangular and close to rotationally symmetric cross sections
264 c 2013-08-28
264 1b IOP Publishing,c 2013
338 a print2 rdacarrier
520 a Close to rotationally symmetric in-plane silicon micronozzles with throat and exit diameters of 45 and 260 µm, respectively, have been fabricated using semi-isotropic SF6 etching through an array mask utilizing microloading and reactive ion etching lag. Comparison with nozzles fabricated using deep reactive ion etching (DRIE) and having a rectangular cross-section but a similar hydraulic diameter in the throat, showed that the Reynolds numbers were almost equal even though the DRIE-etched nozzle had an almost five times larger cross-sectional area, hence implying less viscous losses and higher efficiency with the nearly symmetrical nozzles. The nozzle shapes have been studied using x-ray computed tomography. Comparison of the nozzles' exhaust jets using schlieren imaging, showed that the rectangular nozzles' jets deviate from the nozzle axis direction. It is believed that it is caused by the inclined side walls resulting from the DRIE etching. The results from intentionally misaligning the wafers, each containing half a nozzle, 50 µm parallel with or perpendicular to the nozzle axis, showed that the exhaust deviated and widened, respectively. The findings show that the nozzle symmetry affects both the shape and the pointing direction of the exhaust and that schlieren imaging is a powerful tool for determining nozzle thrust vector deviations.
653 a Teknisk fysik med inriktning mot mikrosystemteknik
653 a Engineering Science with specialization in Microsystems Technology
700a Vargas Catalan, Ernestou Uppsala universitet,Mikrosystemteknik,ÅSTC4 aut0 (Swepub:uu)ernva826
700a Lekholm, Villeu Uppsala universitet,Mikrosystemteknik,ÅSTC4 aut0 (Swepub:uu)ville816
700a Thornell, Gregeru Uppsala universitet,Mikrosystemteknik,ÅSTC4 aut0 (Swepub:uu)gth12095
710a Uppsala universitetb Mikrosystemteknik4 org
773t Journal of Micromechanics and Microengineeringd : IOP Publishingg 23:10, s. 105001-q 23:10<105001-x 0960-1317x 1361-6439
8564 8u https://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-186774
8564 8u https://doi.org/10.1088/0960-1317/23/10/105001

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