Insights into the copper HiPIMS discharge: deposition rate and ionised flux fraction

Fischer, JoelLinköpings universitet,Plasma och ytbeläggningsfysik,Tekniska fakulteten,Evatec AG, Switzerland (författare)

Insights into the copper HiPIMS discharge : deposition rate and ionised flux fraction

QC 20240108
Funding Agencies|Swedish Research Council [VR 2018-04139]; Swedish Government Strategic Research Area in Materials Science on Functional Materials at Linkoeping University [2009-00971]; Icelandic Research Fund (Grant No. 196141), and Evatec AG [196141]; Evatec AG
The influence of pulse length, working gas pressure, and peak discharge current density on the deposition rate and ionised flux fraction in high power impulse magnetron sputtering discharges of copper is investigated experimentally using a charge-selective (electrically biasable) magnetically shielded quartz crystal microbalance (or ionmeter). The large explored parameter space covers both common process conditions and extreme cases. The measured ionised flux fraction for copper is found to be in the range from ≈10% to 80%, and to increase with increasing peak discharge current density up to a maximum at ≈ 1.25 A cm − 2 , before abruptly falling off at even higher current density values. Low working gas pressure is shown to be beneficial in terms of both ionised flux fraction and deposition rate fraction. For example, decreasing the working gas pressure from 1.0 Pa to 0.5 Pa leads on average to an increase of the ionised flux fraction by ≈ 14 percentage points (pp) and of the deposition rate fraction by ≈ 4 pp taking into account all the investigated pulse lengths.

Renner, MaxLinköpings universitet,Plasma och ytbeläggningsfysik,Tekniska fakulteten(Swepub:liu)maxre56 (författare)
Gudmundsson, Jon Tomas,1965-KTH,Rymd- och plasmafysik,Science Institute, University of Iceland, Dunhaga 3, Reykjavik IS-107,KTHRoyal Inst Technol, Sweden; Univ Iceland, Iceland(Swepub:kth)u1q27a34 (författare)
Rudolph, M.Leibniz Institute of Surface Engineering (IOM), Permoserstraße 15, Leipzig DE-04318, Germany,Leibniz Inst Surface Engn IOM, Germany (författare)
Hajihoseini, H.Industrial Focus Group XUV Optics, MESA+ Institute for Nanotechnology, University of Twente, Drienerlolaan 5, Enschede 7522 NB, The Netherlands,Univ Twente, Netherlands (författare)
Brenning, NilsLinköpings universitet,KTH,Rymd- och plasmafysik,Plasma and Coatings Physics Division, Department of Physics, Chemistry, and Biology (IFM), Linköping University, Linköping SE-581 83, Sweden,Plasma och ytbeläggningsfysik,Tekniska fakulteten,KTHRoyal Inst Technol, Sweden(Swepub:liu)nilbr83 (författare)
Lundin, DanielLinköpings universitet,Plasma och ytbeläggningsfysik,Tekniska fakulteten(Swepub:liu)danlu03 (författare)
Linköpings universitetPlasma och ytbeläggningsfysik (creator_code:org_t)

Ingår i:Plasma sources science & technology: IOP Publishing32:120963-02521361-6595

Av författaren/redakt...: Fischer, Joel; Renner, Max; Gudmundsson, Jon ...; Rudolph, M.; Hajihoseini, H.; Brenning, Nils; visa fler...; Lundin, Daniel; visa färre...

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