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Direct experimental verification of shot noise in short channel MOS transistors

Andersson, Stefan, 1975- (author)
Linköpings universitet,Tekniska högskolan,Elektroniska komponenter
Svensson, Christer, 1941- (author)
Linköpings universitet,Tekniska högskolan,Elektroniska komponenter
 (creator_code:org_t)
Institution of Engineering and Technology (IET), 2005
2005
English.
In: Electronics Letters. - : Institution of Engineering and Technology (IET). - 0013-5194 .- 1350-911X. ; 41:15, s. 869-871
  • Journal article (peer-reviewed)
Abstract Subject headings
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  • Drain noise current was measured at an extended temperature range on n-MOS transistors of various lengths made in a 0.18 urn process. A comparison with theoretical noise models strongly indicates the mechanism of shot noise produced near the source by diffusion currents, as proposed by Obrecht et al. © IEE 2005.

Keyword

experimental verification
shot noise
short channel MOS
TECHNOLOGY
TEKNIKVETENSKAP

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art (subject category)

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