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L773:0015 0193 OR L773:1563 5112
 

Sökning: L773:0015 0193 OR L773:1563 5112 > Low frequency chara...

LIBRIS Formathandbok  (Information om MARC21)
FältnamnIndikatorerMetadata
00002713naa a2200361 4500
001oai:research.chalmers.se:5c6336cc-4d92-4f97-8cec-cd713537e2d2
003SwePub
008171007s2001 | |||||||||||000 ||eng|
024a https://research.chalmers.se/publication/2123652 URI
024a https://doi.org/10.1080/001501901082251952 DOI
040 a (SwePub)cth
041 a engb eng
042 9 SwePub
072 7a art2 swepub-publicationtype
072 7a ref2 swepub-contenttype
100a Abadei, Saeed,d 1961u Chalmers tekniska högskola,Chalmers University of Technology4 aut
2451 0a Low frequency characterisation of laser ablation deposited thin Na0.5K0.5NbO3 (NKN) films for microwave application
264 1b Informa UK Limited,c 2001
520 a Experimental results on three types of Na0.5K0.5NbO3 (NKN) film capacitor structures are presented. The epitaxial NKN thin films have been deposited on (100) Si (high resistivity), SiO2/Si (low resistivity) and Pt/Si (low resistivity) substrates using laser ablation deposition. Both straight slot and interdigital electrode have been deposited on top of the NKN films. The leakage current and low frequency dielectric properties (I-V, C-V, tanδ-V) of the structures have been measured at 1 MHz as a function of electric field at room temperature. In all three types of capacitor structures the leakage currents in a-b plane are very small, while along c-axis there are extremely large leakage currents. On low resistivity silicon substrates the tunability of the dielectric permittivity is about 12% and loss tangent is low also. On high resistivity (ρ>10 kOhm cm) silicon substrate the tunability at 1 MHz is extremely high, about 10 times, and the losses are also high. On the other hand at microwave frequencies the losses are small (tanδ
650 7a NATURVETENSKAPx Fysikx Den kondenserade materiens fysik0 (SwePub)103042 hsv//swe
650 7a NATURAL SCIENCESx Physical Sciencesx Condensed Matter Physics0 (SwePub)103042 hsv//eng
653 a microwave
653 a varactor
653 a ferroelectric
653 a tunable device
700a Cho, C4 aut
700a Grishin, Alex4 aut
700a Gevorgian, Spartak,d 1948u Chalmers tekniska högskola,Chalmers University of Technology4 aut0 (Swepub:cth)spartak
710a Chalmers tekniska högskola4 org
773t Integrated Ferroelectricsd : Informa UK Limitedg 263:1, s. 173-179q 263:1<173-179x 1058-4587x 1607-8489
773t Ferroelectricsd : Informa UK Limitedg 263:1, s. 173-179q 263:1<173-179x 0015-0193x 1563-5112
8564 8u https://research.chalmers.se/publication/212365
8564 8u https://doi.org/10.1080/00150190108225195

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