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Search: WFRF:(Urbonaite Sigita) > (2012) > Deposition and char...

LIBRIS Formathandbok  (Information om MARC21)
FältnamnIndikatorerMetadata
00003285naa a2200445 4500
001oai:DiVA.org:uu-174582
003SwePub
008120522s2012 | |||||||||||000 ||eng|
024a https://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-1745822 URI
024a https://doi.org/10.1016/j.vacuum.2012.01.0212 DOI
040 a (SwePub)uu
041 a engb eng
042 9 SwePub
072 7a ref2 swepub-contenttype
072 7a art2 swepub-publicationtype
100a Andersson, Matildau Uppsala universitet,Oorganisk kemi4 aut0 (Swepub:uu)matha990
2451 0a Deposition and characterization of magnetron sputtered amorphous Cr-C films
264 1b Elsevier BV,c 2012
338 a print2 rdacarrier
520 a Thin films in the Cr-C system with carbon content of 25-85 at.% have been deposited using non-reactive DC magnetron sputtering from elemental targets. Analyses with X-ray diffraction and transmission electron microscopy confirm that the films are completely amorphous. Also, annealing experiment show that the films had not crystallized at 500 degrees C. Furthermore, X-ray spectroscopy and Raman spectroscopy show that the films consist of two phases, an amorphous CrCx phase and an amorphous carbon (a-C) phase. The presence of two amorphous phases is also supported by the electrochemical analysis, which shows that oxidation of both chromium and carbon contributes to the total current in the passive region. The relative amounts of these amorphous phases influence the film properties. Typically, lower carbon content with less a-C phase leads to harder films with higher Young's modulus and lower resistivity. The results also show that both films have lower currents in the passive region compared to the uncoated 316L steel substrate. Finally, our results were compared with literature data from both reactively and non-reactively sputtered chromium carbide films. The comparison reveals that non-reactive sputtering tend to favour the formation of amorphous films and also influence e.g. the sp(2)/sp(3) ratio of the a-C phase. 
650 7a NATURVETENSKAPx Kemix Oorganisk kemi0 (SwePub)104042 hsv//swe
650 7a NATURAL SCIENCESx Chemical Sciencesx Inorganic Chemistry0 (SwePub)104042 hsv//eng
653 a Amorphous
653 a Chromium carbide
653 a Magnetron sputtering
653 a Electrochemical
653 a Nanoindentation
653 a Inorganic chemistry
653 a Oorganisk kemi
653 a Kemi med inriktning mot oorganisk kemi
653 a Chemistry with specialization in Inorganic Chemistry
700a Högström, Jonasu Uppsala universitet,Oorganisk kemi4 aut0 (Swepub:uu)johog205
700a Urbonaite, Sigitau Uppsala universitet,Strukturkemi4 aut
700a Furlan, Andreju Uppsala universitet,Oorganisk kemi4 aut
700a Nyholm, Leifu Uppsala universitet,Oorganisk kemi4 aut0 (Swepub:uu)lny18455
700a Jansson, Ulfu Uppsala universitet,Oorganisk kemi4 aut0 (Swepub:uu)uja03434
710a Uppsala universitetb Oorganisk kemi4 org
773t Vacuumd : Elsevier BVg 86:9, s. 1408-1416q 86:9<1408-1416x 0042-207Xx 1879-2715
8564 8u https://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-174582
8564 8u https://doi.org/10.1016/j.vacuum.2012.01.021

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