WFRF:(Lu FX)
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| Fältnamn | Indikatorer | Metadata |
|---|---|---|
| 000 | 03385naa a2200373 4500 | |
| 001 | oai:DiVA.org:ltu-8265 | |
| 003 | SwePub | |
| 008 | 160929s2007 | |||||||||||000 ||eng| | |
| 024 | 7 | a https://urn.kb.se/resolve?urn=urn:nbn:se:ltu:diva-82652 URI |
| 024 | 7 | a https://doi.org/10.1016/j.vacuum.2006.09.0152 DOI |
| 040 | a (SwePub)ltu | |
| 041 | a engb eng | |
| 042 | 9 SwePub | |
| 072 | 7 | a ref2 swepub-contenttype |
| 072 | 7 | a art2 swepub-publicationtype |
| 100 | 1 | a Askari, SJu Department of High Tech Thin Films, School of Materials Science and Engineering, University of Science and Technology Beijing4 aut |
| 245 | 1 0 | a Two-step growth of high-quality nano-diamond films using CH 4/H 2 gas mixture |
| 264 | 1 | b Elsevier BV,c 2007 |
| 338 | a print2 rdacarrier | |
| 500 | a Upprättat; 2007; 20150416 (farakh) | |
| 520 | a Diamond films with fine grain size and good quality were successfully deposited on pure titanium substrate using a novel two-step growth technique in microwave plasma-assisted chemical vapor deposition (MWPCVD) system. The films were grown with varying the methane (CH4) concentration at the stage of bias-enhanced nucleation (BEN) and nano-diamond film deposition. It was found that nano-diamond nuclei were formed at a relatively high methane concentration, causing a secondary nucleation at the accompanying growth step. Nano-diamond film deposition on pure titanium was always very hard due to the high diffusion coefficient of carbon in Ti, the big difference between thermal expansion coefficients of diamond and Ti, the complex nature of the interlayer created during diamond deposition, and the difficulty in achieving very high nucleation density. A smooth and well-adhered nano-diamond film was successfully obtained on pure Ti substrate. Detailed experimental results on the synthesis, characterization and successful deposition of the nano-diamond film on pure Ti are discussed | |
| 650 | 7 | a TEKNIK OCH TEKNOLOGIERx Materialteknikx Annan materialteknik0 (SwePub)205992 hsv//swe |
| 650 | 7 | a ENGINEERING AND TECHNOLOGYx Materials Engineeringx Other Materials Engineering0 (SwePub)205992 hsv//eng |
| 653 | a Engineering Materials | |
| 653 | a Materialteknik | |
| 700 | 1 | a Akhtar, Faridu Department of High Tech Thin Films, School of Materials Science and Engineering, University of Science and Technology Beijing4 aut0 (Swepub:ltu)farakh |
| 700 | 1 | a Islam, S.H.u Department of High Tech Thin Films, School of Materials Science and Engineering, University of Science and Technology Beijing4 aut |
| 700 | 1 | a Qi, Hu Department of High Tech Thin Films, School of Materials Science and Engineering, University of Science and Technology Beijing4 aut |
| 700 | 1 | a Tang, WZu Department of High Tech Thin Films, School of Materials Science and Engineering, University of Science and Technology Beijing4 aut |
| 700 | 1 | a Lu, FXu Department of High Tech Thin Films, School of Materials Science and Engineering, University of Science and Technology Beijing4 aut |
| 710 | 2 | a Department of High Tech Thin Films, School of Materials Science and Engineering, University of Science and Technology Beijing4 org |
| 773 | 0 | t Vacuumd : Elsevier BVg 81:5, s. 713-717q 81:5<713-717x 0042-207Xx 1879-2715 |
| 856 | 4 8 | u https://urn.kb.se/resolve?urn=urn:nbn:se:ltu:diva-8265 |
| 856 | 4 8 | u https://doi.org/10.1016/j.vacuum.2006.09.015 |
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- Askari, SJ
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