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WFRF:(Gong Shengjie)
 

Sökning: WFRF:(Gong Shengjie) > Diagnostic techniqu...

LIBRIS Formathandbok  (Information om MARC21)
FältnamnIndikatorerMetadata
00003424naa a2200421 4500
001oai:DiVA.org:kth-27358
003SwePub
008101213s2010 | |||||||||||000 ||eng|
024a https://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-273582 URI
024a https://doi.org/10.1007/s10404-010-0626-z2 DOI
040 a (SwePub)kth
041 a engb eng
042 9 SwePub
072 7a ref2 swepub-contenttype
072 7a art2 swepub-publicationtype
100a Gong, Shengjieu KTH,Kärnkraftssäkerhet4 aut0 (Swepub:kth)u1oxzn33
2451 0a Diagnostic techniques for the dynamics of a thin liquid film under forced flow and evaporating conditions
264 c 2010-05-21
264 1b Springer Science and Business Media LLC,c 2010
338 a print2 rdacarrier
500 a QC 20101214
520 a Motivated by quantification of micro-hydrodynamics of a thin liquid film which is present in industrial processes, such as spray cooling, heating (e.g., boiling with the macrolayer and the microlayer), coating, cleaning, and lubrication, we use micro-conductive probes and confocal optical sensors to measure the thickness and dynamic characteristics of a liquid film on a silicon wafer surface with or without heating. The simultaneous measurement on the same liquid film shows that the two techniques are in a good agreement with respect to accuracy, but the optical sensors have a much higher acquisition rate up to 30 kHz which is more suitable for rapid process. The optical sensors are therefore used to measure the instantaneous film thickness in an isothermal flow over a silicon wafer, obtaining the film thickness profile and the interfacial wave. The dynamic thickness of an evaporating film on a horizontal silicon wafer surface is also recorded by the optical sensor for the first time. The results indicate that the critical thickness initiating film instability on the silicon wafer is around 84 mu m at heat flux of similar to 56 kW/m(2). In general, the tests performed show that the confocal optical sensor is capable of measuring liquid film dynamics at various conditions, while the micro-conductive probe can be used to calibrate the optical sensor by simultaneous measurement of a film under quasi-steady state. The micro-experimental methods provide the solid platform for further investigation of the liquid film dynamics affected by physicochemical properties of the liquid and surfaces as well as thermal-hydraulic conditions.
650 7a NATURVETENSKAPx Fysik0 (SwePub)1032 hsv//swe
650 7a NATURAL SCIENCESx Physical Sciences0 (SwePub)1032 hsv//eng
653 a Thin liquid film
653 a Film dynamics
653 a Diagnostic technique
653 a Confocal optical sensor
653 a Micro-conductive probe
653 a Physics
653 a Fysik
700a Ma, Weiminu KTH,Kärnkraftssäkerhet4 aut0 (Swepub:kth)u1wa8dki
700a Dinh, Truc-Namu KTH,Kärnkraftssäkerhet4 aut0 (Swepub:kth)u1b2q728
710a KTHb Kärnkraftssäkerhet4 org
773t MICROFLUID NANOFLUIDd : Springer Science and Business Media LLCg 9:6, s. 1077-1089q 9:6<1077-1089x 1613-4982
773t Microfluidics and Nanofluidicsd : Springer Science and Business Media LLCg 9:6, s. 1077-1089q 9:6<1077-1089x 1613-4990
8564 8u https://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-27358
8564 8u https://doi.org/10.1007/s10404-010-0626-z

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Gong, Shengjie
Ma, Weimin
Dinh, Truc-Nam
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