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  • Yager, Thomas,1987Chalmers tekniska högskola,Chalmers University of Technology (author)

Low contact resistance in epitaxial graphene devices for quantum metrology

  • Article/chapterEnglish2015

Publisher, publication year, extent ...

  • AIP Publishing,2015
  • electronicrdacarrier

Numbers

  • LIBRIS-ID:oai:research.chalmers.se:993363aa-8848-4571-88cb-77fec1380c1c
  • https://doi.org/10.1063/1.4928653DOI
  • https://research.chalmers.se/publication/222567URI
  • https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-122071URI

Supplementary language notes

  • Language:English
  • Summary in:English

Part of subdatabase

Classification

  • Subject category:art swepub-publicationtype
  • Subject category:ref swepub-contenttype

Notes

  • Funding Agencies|Graphene Flagship [CNECT-ICT-604391]; Swedish Foundation for Strategic Research (SSF); Linnaeus Centre for Quantum Engineering; Knut and Alice Wallenberg Foundation; Chalmers AoA Nano; Swedish-Korean Basic Research Cooperative Program of the NRF [2014R1A2A1A1 2067266]; EMRP project GraphOhm; EMRP within EURAMET; EMRP within European Union
  • We investigate Ti/Au contacts to monolayer epitaxial graphene on SiC (0001) for applications in quantum resistance metrology. Using three-terminal measurements in the quantum Hall regime we observed variations in contact resistances ranging from a minimal value of 0.6 Ω up to 11 kΩ. We identify a major source of high-resistance contacts to be due bilayer graphene interruptions to the quantum Hall current, whilst discarding the effects of interface cleanliness and contact geometry for our fabricated devices. Moreover, we experimentally demonstrate methods to improve the reproducibility of low resistance contacts (

Subject headings and genre

Added entries (persons, corporate bodies, meetings, titles ...)

  • Lartsev, Arseniy,1987Chalmers tekniska högskola,Chalmers University of Technology,Chalmers, Sweden(Swepub:cth)arseniy (author)
  • Cedergren, Karin,1975University of New South Wales (UNSW),University of New S Wales, Australia(Swepub:cth)karince (author)
  • Yakimova, RositsaLinköpings universitet,Halvledarmaterial,Tekniska fakulteten(Swepub:liu)rosia15 (author)
  • Panchal, V.National Physical Laboratory (NPL),National Phys Lab, England (author)
  • Kazakova, O.National Physical Laboratory (NPL),National Phys Lab, England (author)
  • Tzalenchuk, A.Y.Royal Holloway University of London,National Physical Laboratory (NPL),National Phys Lab, England; University of London, England (author)
  • Kim, Kyung Ho,1984Seoul National University,Seoul National University, South Korea(Swepub:cth)kyungh (author)
  • Park, YungWooSeoul National University (author)
  • Lara Avila, Samuel,1983Chalmers tekniska högskola,Chalmers University of Technology,Chalmers, Sweden(Swepub:cth)larsavil (author)
  • Kubatkin, Sergey,1959Chalmers tekniska högskola,Chalmers University of Technology,Chalmers, Sweden(Swepub:cth)kubatkin (author)
  • Yager, TomChalmers, Sweden (author)
  • Woo Park, YungSeoul National University, South Korea (author)
  • Chalmers tekniska högskolaChalmers, Sweden (creator_code:org_t)

Related titles

  • In:AIP Advances: AIP Publishing5:8, s. 087134-2158-32262158-3226

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