Quantum resistance metrology using graphene

Tzalenchuk, Alexander, 1962 (författare): Royal Holloway University of London,National Physical Laboratory (NPL)

Lara Avila, Samuel, 1983 (författare): Chalmers tekniska högskola,Chalmers University of Technology

Kubatkin, Sergey, 1959 (författare): Chalmers tekniska högskola,Chalmers University of Technology

(creator_code:org_t)

2013-10-03
2013
Engelska.
Ingår i: Reports on Progress in Physics. - : IOP Publishing. - 0034-4885 .- 1361-6633. ; 76:10

Relaterad länk:: http://dx.doi.org/10...; visa fler...; http://arxiv.org/pdf...; https://doi.org/10.1...; https://research.cha...; visa färre...

Abstract Ämnesord

Stäng

In this paper, we review the recent extraordinary progress in the development of a new quantum standard for resistance based on graphene. We discuss the unique properties of this material system relating to resistance metrology and discuss results of the recent highest-ever precision direct comparison of the Hall resistance between graphene and traditional GaAs. We mainly focus our review on graphene expitaxially grown on SiC, a system which so far resulted in the best results. We also briefly discuss progress in the two other graphene material systems, exfoliated graphene and chemical vapour deposition graphene, and make a critical comparison with SiC graphene. Finally, we discuss other possible applications of graphene in metrology.

Av författaren/redakt...: Janssen, Tjbm; Tzalenchuk, Alex ...; Lara Avila, Samu ...; Kubatkin, Sergey ...; Fal'ko, V. I.

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