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Reactive Deposition...
Reactive Deposition of TiN Films by Magnetron with Magnetized Hollow Cathode Enhanced Target
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- Barankova, Hana (författare)
- Uppsala universitet,Elektricitetslära,BB Plasma Design AB, Uppsala, Sweden,The Plasma group
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- Bardos, Ladislav (författare)
- Uppsala universitet,Elektricitetslära,BB Plasma Design AB, Uppsala, Sweden,The plasma group
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- Silins, Kaspars, 1987- (författare)
- Uppsala universitet,Elektricitetslära,The Plasma group
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- Bardos, A. (författare)
- BB Plasma Design AB
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(creator_code:org_t)
- Elsevier BV, 2018
- 2018
- Engelska.
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Ingår i: Vacuum. - : Elsevier BV. - 0042-207X .- 1879-2715. ; 152, s. 123-127
- Relaterad länk:
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https://urn.kb.se/re...
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https://doi.org/10.1...
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Abstract
Ämnesord
Stäng
- Magnetized Hollow Cathode Activated Magnetron in which the target is coupled with the hollow cathode magnetized by the magnetic field of the magnetron was tested in the reactive process of TiN deposition. Increased deposition rate compared to the Ti metal deposition rate was confirmed. The depositions as well as optical measurements were performed at several pressures in the reactor. The results of the TiN reactive deposition are presented and discussed, including the TiN deposition in pure nitrogen.
Ämnesord
- TEKNIK OCH TEKNOLOGIER -- Materialteknik -- Bearbetnings-, yt- och fogningsteknik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Materials Engineering -- Manufacturing, Surface and Joining Technology (hsv//eng)
Nyckelord
- Ionized magnetron
- Reactive deposition in ionized magnetron
- Magnetized hollow cathode
- Hollow cathode activated magnetron
- Hollow cathode enhanced target
Publikations- och innehållstyp
- ref (ämneskategori)
- art (ämneskategori)
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