WFRF:(Carlberg Patrick)
Sökning: WFRF:(Carlberg Patrick) > Scanning probe lith...
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| Fältnamn | Indikatorer | Metadata |
|---|---|---|
| 000 | 02871naa a2200373 4500 | |
| 001 | oai:lup.lub.lu.se:f2c1fca3-b4f1-473f-a468-0a06ed5b6bca | |
| 003 | SwePub | |
| 008 | 160401s2006 | |||||||||||000 ||eng| | |
| 024 | 7 | a https://lup.lub.lu.se/record/4059202 URI |
| 024 | 7 | a https://doi.org/10.1088/0957-4484/17/12/0342 DOI |
| 040 | a (SwePub)lu | |
| 041 | a engb eng | |
| 042 | 9 SwePub | |
| 072 | 7 | a art2 swepub-publicationtype |
| 072 | 7 | a ref2 swepub-contenttype |
| 100 | 1 | a Luo, Gangu Lund University,Lunds universitet,Fasta tillståndets fysik,Fysiska institutionen,Institutioner vid LTH,Lunds Tekniska Högskola,Solid State Physics,Department of Physics,Departments at LTH,Faculty of Engineering, LTH4 aut0 (Swepub:lu)ftf-ggl |
| 245 | 1 0 | a Scanning probe lithography for nanoimprinting mould fabrication |
| 264 | c 2006-06-02 | |
| 264 | 1 | b IOP Publishing,c 2006 |
| 520 | a We propose a rational fabrication method for nanoimprinting moulds by scanning probe lithography. By wet chemical etching, different kinds of moulds are realized on Si( 110) and Si( 100) surfaces according to the Si crystalline orientation. The structures have line widths of about 200 nm with a high aspect ratio. By reactive ion etching, moulds with patterns free from the limitation of Si crystalline orientation are also obtained. With closed-loop scan control of a scanning probe microscope, the length of patterned lines is more than 100 mu m by integrating several steps of patterning. The fabrication process is optimized in order to produce a mould pattern with a line width about 10 nm. The structures on the mould are further duplicated into PMMA resists through the nanoimprinting process. The method of combining scanning probe lithography with wet chemical etching or reactive ion etching (RIE) provides a resistless route for the fabrication of nanoimprinting moulds. | |
| 650 | 7 | a TEKNIK OCH TEKNOLOGIERx Nanoteknikx Nanoteknik0 (SwePub)210012 hsv//swe |
| 650 | 7 | a ENGINEERING AND TECHNOLOGYx Nano-technologyx Nano-technology0 (SwePub)210012 hsv//eng |
| 700 | 1 | a Xie, GY4 aut |
| 700 | 1 | a Zhang, YY4 aut |
| 700 | 1 | a Zhang, GM4 aut |
| 700 | 1 | a Zhang, YY4 aut |
| 700 | 1 | a Carlberg, Patricku Lund University,Lunds universitet,Fasta tillståndets fysik,Fysiska institutionen,Institutioner vid LTH,Lunds Tekniska Högskola,Solid State Physics,Department of Physics,Departments at LTH,Faculty of Engineering, LTH4 aut0 (Swepub:lu)ftf-pca |
| 700 | 1 | a Zhu, T4 aut |
| 700 | 1 | a Liu, ZF4 aut |
| 710 | 2 | a Fasta tillståndets fysikb Fysiska institutionen4 org |
| 773 | 0 | t Nanotechnologyd : IOP Publishingg 17:12, s. 3018-3022q 17:12<3018-3022x 0957-4484x 1361-6528 |
| 856 | 4 | u http://dx.doi.org/10.1088/0957-4484/17/12/034y FULLTEXT |
| 856 | 4 8 | u https://lup.lub.lu.se/record/405920 |
| 856 | 4 8 | u https://doi.org/10.1088/0957-4484/17/12/034 |
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