Characterization Techniques for Thin and Thick Ferroelectric Films

• A few measurement techniques are presented for characterization of thin and thick ferroelectric films at microwave frequencies. Broadband reflection type measurements using a probe station are considered for on wafer characterization of thin films. The accuracy of the method is analyzed with respect to measurement residual systematic errors. A test structure is introduced allowing quick and accurate extraction of the film parameters based on the rigorous full-wave model. Two measurement techniques are reported for electrode-less characterization of thick ferroelectric films. The first method (X-band) is based on the reflection type measurement of a resonator established by a layered alumina/ferroelectric sample loaded in a cut-off waveguide. The second method (B-band) utilizes an open resonator (OR) technique. Theoretical and experimental results are presented.

Ämnesord

TEKNIK OCH TEKNOLOGIER  -- Materialteknik -- Annan materialteknik (hsv//swe)

ENGINEERING AND TECHNOLOGY  -- Materials Engineering -- Other Materials Engineering (hsv//eng)

TEKNIK OCH TEKNOLOGIER  -- Elektroteknik och elektronik -- Annan elektroteknik och elektronik (hsv//swe)

ENGINEERING AND TECHNOLOGY  -- Electrical Engineering, Electronic Engineering, Information Engineering -- Other Electrical Engineering, Electronic Engineering, Information Engineering (hsv//eng)

Nyckelord

ferroelectrics

impedance

dielectric properties

Films

Publikations- och innehållstyp

art (ämneskategori)

ref (ämneskategori)