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Scalable Fabrication of Edge Contacts to 2D Materials : Implications for Quantum Resistance Metrology and 2D Electronics

Shetty, Naveen, 1988 (author)
Chalmers University of Technology, Sweden,Chalmers tekniska högskola,Chalmers Univ Technol, Sweden
He, Hans (author)
RISE,Mätteknik,Chalmers University of Technology, Sweden,Chalmers tekniska högskola,RISE Research Institutes of Sweden,Chalmers Univ Technol, Sweden; RISE Res Inst Sweden, Sweden
Mitra, Richa, 1992 (author)
Chalmers University of Technology, Sweden,Chalmers tekniska högskola,Chalmers Univ Technol, Sweden
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Huhtasaari, Johanna, 1999 (author)
Chalmers University of Technology, Sweden,Chalmers tekniska högskola,Chalmers Univ Technol, Sweden
Iordanidou, Konstantina, 1989 (author)
Chalmers University of Technology, Sweden,Chalmers tekniska högskola,Chalmers Univ Technol, Sweden
Wiktor, Julia, 1988 (author)
Chalmers University of Technology, Sweden,Chalmers tekniska högskola,Chalmers Univ Technol, Sweden
Kubatkin, Sergey, 1959 (author)
Chalmers University of Technology, Sweden,Chalmers tekniska högskola,Chalmers Univ Technol, Sweden
Dash, Saroj Prasad, 1975 (author)
Chalmers University of Technology, Sweden,Chalmers tekniska högskola,Chalmers Univ Technol, Sweden
Yakimova, Rositsa (author)
Linköpings universitet,Halvledarmaterial,Tekniska fakulteten,Linköping University, Sweden
Zeng, Lunjie, 1983 (author)
Chalmers University of Technology, Sweden,Chalmers tekniska högskola,Chalmers Univ Technol, Sweden
Olsson, Eva, 1960 (author)
Chalmers University of Technology, Sweden,Chalmers tekniska högskola,Chalmers Univ Technol, Sweden
Lara Avila, Samuel, 1983 (author)
Chalmers University of Technology, Sweden; NPL National Physical Laboratory, UK,Chalmers tekniska högskola,National Physical Laboratory (NPL),Chalmers Univ Technol, Sweden; Natl Phys Lab, England
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 (creator_code:org_t)
2023-03-30
2023
English.
In: ACS Applied Nano Materials. - : American Chemical Society. - 2574-0970. ; 6:7, s. 6292-
  • Journal article (peer-reviewed)
Abstract Subject headings
Close  
  • We report a reliable and scalable fabrication method for producing electrical contacts to two-dimensional (2D) materials based on the tri-layer resist system. We demonstrate the applicability of this method in devices fabricated on epitaxial graphene on silicon carbide (epigraphene) used as a scalable 2D material platform. For epigraphene, data on nearly 70 contacts result in median values of the one-dimensional (1D) specific contact resistances ρc ∼ 67 Ω·μm and follow the Landauer quantum limit ρc ∼ n-1/2, consistently reaching values ρc < 50 Ω·μm at high carrier densityn. As a proof of concept, we apply the same fabrication method to the transition metal dichalcogenide (TMDC) molybdenum disulfide (MoS2). Our edge contacts enable MoS2 field-effect transistor (FET) behavior with an ON/OFF ratio of >106 at room temperature (>109 at cryogenic temperatures). The fabrication route demonstrated here allows for contact metallization using thermal evaporation and also by sputtering, giving an additional flexibility when designing electrical interfaces, which is key in practical devices and when exploring the electrical properties of emerging materials. © 2023 The Authors. 

Subject headings

NATURVETENSKAP  -- Fysik -- Den kondenserade materiens fysik (hsv//swe)
NATURAL SCIENCES  -- Physical Sciences -- Condensed Matter Physics (hsv//eng)
TEKNIK OCH TEKNOLOGIER  -- Materialteknik -- Textil-, gummi- och polymermaterial (hsv//swe)
ENGINEERING AND TECHNOLOGY  -- Materials Engineering -- Textile, Rubber and Polymeric Materials (hsv//eng)
TEKNIK OCH TEKNOLOGIER  -- Materialteknik -- Annan materialteknik (hsv//swe)
ENGINEERING AND TECHNOLOGY  -- Materials Engineering -- Other Materials Engineering (hsv//eng)

Keyword

2D material
edge-contacts
epitaxial graphene
graphene
MoS2
Fabrication
Field effect transistors
Graphene transistors
Layered semiconductors
Molybdenum disulfide
Silicon carbide
Thermal evaporation
Transition metals
Edge contacts
Electrical contacts
Fabrication method
Material-based
Quantum resistance
Resist systems
Tri-layer resists
Two-dimensional

Publication and Content Type

ref (subject category)
art (subject category)

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