WFRF:(Malm J. E M)
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Low-frequency noise and Coulomb scattering in Si0.8 Ge0.2 surface channel pMOSFET's with ALD Al2O3 gate dielectrics
- von Haartman, M (author)
-
- Westlinder, J (author)
- Uppsala universitet,Fasta tillståndets elektronik,Institutionen för teknikvetenskaper,Elektronik
- Wu, D (author)
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- Malm, BG (author)
- Hellström, P-E (author)
- Östling, M (author)
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- (creator_code:org_t)
- 2005
- 2005
- English.
- In: Solid-State Electronics. - 0038-1101 .- 1879-2405. ; 49, s. 907-914
- Journal article (peer-reviewed)
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- Olsson, Jörgen
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