Neutron reflectometry of anionic surfactants on sapphire: A strong maximum in the adsorption near the critical micelle concentration

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Fältnamn	Indikatorer	Metadata
000		02639naa a2200385 4500
001		oai:DiVA.org:uu-297770
003		SwePub
008		160628s2016 \| \|\|\|\|\|\|\|\|\|\|\|000 \|\|eng\|
024	7	a https://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-2977702 URI
024	7	a https://doi.org/10.1016/j.jcis.2016.03.0142 DOI
040		a (SwePub)uu
041		a engb eng
042		9 SwePub
072	7	a ref2 swepub-contenttype
072	7	a art2 swepub-publicationtype
100	1	a Li, Ning Ningu Univ Oxford, Dept Chem, Phys & Theoret Chem Lab, S Parks Rd, Oxford OX1 3QZ, England.4 aut
245	1 0	a Neutron reflectometry of anionic surfactants on sapphire :b A strong maximum in the adsorption near the critical micelle concentration
264	1	b Elsevier BV,c 2016
338		a print2 rdacarrier
520		a The adsorption of the anionic surfactants, lithium, sodium and cesium dodecylsulfates, and sodium decylsulfonate, on the positively charged C-plane (0001) of sapphire (alumina) has been measured using neutron reflection. For each of the four surfactants there is a strong maximum in the adsorption at about the critical micelle concentration. The maximum becomes more marked from lithium to cesium. The measurements were reproduced over a range of different physical conditions and could not be accounted for in terms of impurities. The maximum is explained quantitatively by using the combination of a mass action model to calculate the mean activity of the surfactant, and a cooperative model of the adsorption (Frumkin), in which saturation of the layer is not attained until well above the critical micelle concentration.
650	7	a NATURVETENSKAPx Kemix Materialkemi0 (SwePub)104032 hsv//swe
650	7	a NATURAL SCIENCESx Chemical Sciencesx Materials Chemistry0 (SwePub)104032 hsv//eng
653		a Surfactant adsorption
653		a Solid-liquid interface
653		a Adsorption maximum
653		a Sodium dodecylsulfate
653		a Neutron reflection
653		a Adsorption isotherm
653		a Charged surface
700	1	a Thomas, Robert K.u Univ Oxford, Dept Chem, Phys & Theoret Chem Lab, S Parks Rd, Oxford OX1 3QZ, England.4 aut
700	1	a Rennie, Adrian R.u Uppsala universitet,Materialfysik4 aut0 (Swepub:uu)adren227
710	2	a Univ Oxford, Dept Chem, Phys & Theoret Chem Lab, S Parks Rd, Oxford OX1 3QZ, England.b Materialfysik4 org
773	0	t Journal of Colloid and Interface Scienced : Elsevier BVg 471, s. 81-88q 471<81-88x 0021-9797x 1095-7103
856	4 8	u https://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-297770
856	4 8	u https://doi.org/10.1016/j.jcis.2016.03.014

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