Grain growth behavior, surface morphology evolution, structures, and optical properties of ZnO thin films prepared by RF reactive magnetron sputtering

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Fältnamn	Indikatorer	Metadata
000		03103naa a2200385 4500
001		oai:DiVA.org:su-102495
003		SwePub
008		140407s2014 \| \|\|\|\|\|\|\|\|\|\|\|000 \|\|eng\|
024	7	a https://urn.kb.se/resolve?urn=urn:nbn:se:su:diva-1024952 URI
040		a (SwePub)su
041		a engb eng
042		9 SwePub
072	7	a ref2 swepub-contenttype
072	7	a art2 swepub-publicationtype
100	1	a Lu, Hui4 aut
245	1 0	a Grain growth behavior, surface morphology evolution, structures, and optical properties of ZnO thin films prepared by RF reactive magnetron sputtering
264	1	b NATL INST OPTOELECTRONICS,c 2014
338		a print2 rdacarrier
500		a AuthorCount:6;
520		a ZnO thin films were prepared by radio frequency (RF) reactive magnetron sputtering at varying deposition conditions. The effects of RF power (from 40 to 90 W) and substrate temperature (from 100 to 200 degrees C) on the grain growth behavior, surface morphology evolution, and the structural and optical properties of the films were investigated. Atomic force microscopy (AFM) measurements confirmed that the grain size and surface roughness depend mainly on the RF power and increase with increasing it at the initial deposition stage of 5 s, and are strongly affected by the substrate temperature and increase with increasing it at the final deposition stage of 45 min. The influence of both the deposition parameters on the surface structure of the ZnO films at different deposition stages and the mechanism concerning this influence were discussed. The X-ray diffraction (XRD) and optical absorption spectra analysis indicated that all the films deposited for 45 min are in the state of the compressive stress and exhibit polycrystalline nature with the (002) preferential orientation, and they have high optical transparency in the visible range and sharp absorption edges around the wavelength 360 nm corresponding to the ZnO exciton. With the increase of the RF power and substrate temperature, the grain size increases, the residual compressive stress relaxes, and the optical band gaps broaden. In comparison with the RF power, the substrate temperature has more evident influence on the microstructure of the ZnO thin films.
650	7	a TEKNIK OCH TEKNOLOGIERx Materialteknik0 (SwePub)2052 hsv//swe
650	7	a ENGINEERING AND TECHNOLOGYx Materials Engineering0 (SwePub)2052 hsv//eng
653		a ZnO Thin films
653		a RE magnetron sputtering
653		a Deposition
653		a Microstructure
653		a Optical properties
700	1	a Zheng, Zhi-Jia4 aut
700	1	a Lin, Xian4 aut
700	1	a Xu, Fei4 aut
700	1	a Bi, Han4 aut
700	1	a Laaksonen, Aattou Stockholms universitet,Avdelningen för fysikalisk kemi4 aut0 (Swepub:su)aatto
710	2	a Stockholms universitetb Avdelningen för fysikalisk kemi4 org
773	0	t Journal of Optoelectronics and Advanced Materialsd : NATL INST OPTOELECTRONICSg 16:1-2, s. 170-175q 16:1-2<170-175x 1454-4164x 1841-7132
856	4 8	u https://urn.kb.se/resolve?urn=urn:nbn:se:su:diva-102495

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By the author/editor: Lu, Hui; Zheng, Zhi-Jia; Lin, Xian; Xu, Fei; Bi, Han; Laaksonen, Aatto

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ENGINEERING AND TECHNOLOGY: ENGINEERING AND ...; and Materials Engine ...

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By the university: Stockholm University

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