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  • Soldemo, MarkusKTH,KTH Royal Institute of Technology,Materialfysik, MF (author)

Interaction of sulfur dioxide and near-ambient pressures of water vapor with cuprous oxide surfaces

  • Article/chapterEnglish2017

Publisher, publication year, extent ...

  • 2017-10-18
  • American Chemical Society (ACS),2017

Numbers

  • LIBRIS-ID:oai:lup.lub.lu.se:47ec8ab7-d337-4488-91df-87d07a212378
  • https://lup.lub.lu.se/record/47ec8ab7-d337-4488-91df-87d07a212378URI
  • https://doi.org/10.1021/acs.jpcc.7b06486DOI
  • https://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-217544URI

Supplementary language notes

  • Language:English
  • Summary in:English

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  • Subject category:art swepub-publicationtype
  • Subject category:ref swepub-contenttype

Notes

  • QC 20171116
  • The interaction of water vapor and sulfur dioxide (SO2) with single crystal cuprous oxide (Cu2O) surfaces of (100) and (111) termination was studied by photoelectron spectroscopy (PES) and density functional theory (DFT). Exposure to near-ambient pressures of water vapor, at 5 × 10-3 %RH and 293 K, hydroxylates both Cu2O surfaces with OH coverage up to 0.38 copper monolayers (ML) for (100) and 0.25 ML for (111). O 1s surface core level shifts indicate that the hydroxylation lifts the (3,0;1,1) reconstruction of the clean (100) surface. On both clean Cu2O terminations, SO2 adsorbs to unsaturated surface oxygen atoms to form SO3 species with coverage, after a saturating SO2 dose, corresponding to 0.20 ML on the Cu2O(100) surface and 0.09 ML for the Cu2O(111) surface. Our combined DFT and PES results suggest that the SO2 to SO3 transformation is largely facilitated by unsaturated copper atoms at the Cu2O(111) surface. SO3-terminated surfaces exposed to low doses of water vapor (=100 langmuirs) in ultrahigh vacuum show no adsorption or reaction. However, during exposure to near-ambient pressures of water vapor, the SO3 species dissociate, and sulfur replaces a Cu2O lattice oxygen in a reaction that forms Cu2S. The hydroxylation of the Cu2O surfaces is believed to play a central role in the reaction.

Subject headings and genre

Added entries (persons, corporate bodies, meetings, titles ...)

  • Halldin Stenlid, JoakimKTH,KTH Royal Institute of Technology,Tillämpad fysikalisk kemi(Swepub:kth)u1709vkg (author)
  • Besharat, ZahraKTH,KTH Royal Institute of Technology,Materialfysik, MF(Swepub:kth)u1i8i7y1 (author)
  • Johansson, NiclasLund University,Lunds universitet,Synkrotronljusfysik,Fysiska institutionen,Institutioner vid LTH,Lunds Tekniska Högskola,Synchrotron Radiation Research,Department of Physics,Departments at LTH,Faculty of Engineering, LTH(Swepub:lu)slju-naj (author)
  • Önsten, AnneliKTH,KTH Royal Institute of Technology,Materialfysik, MF(Swepub:kth)u1i81w4r (author)
  • Knudsen, JanLund University,Lunds universitet,MAX IV-laboratoriet,Synkrotronljusfysik,Fysiska institutionen,Institutioner vid LTH,Lunds Tekniska Högskola,MAX IV Laboratory,Synchrotron Radiation Research,Department of Physics,Departments at LTH,Faculty of Engineering, LTH(Swepub:lu)slju-jks (author)
  • Schnadt, JoachimLund University,Lunds universitet,MAX IV-laboratoriet,Synkrotronljusfysik,Fysiska institutionen,Institutioner vid LTH,Lunds Tekniska Högskola,MAX IV Laboratory,Synchrotron Radiation Research,Department of Physics,Departments at LTH,Faculty of Engineering, LTH(Swepub:lu)slju-jst (author)
  • Göthelid, MatsKTH,KTH Royal Institute of Technology,Materialfysik, MF(Swepub:kth)u1uq5dqb (author)
  • Brinck, ToreKTH,KTH Royal Institute of Technology,Tillämpad fysikalisk kemi(Swepub:kth)u1ar43qu (author)
  • Weissenrieder, JonasKTH,KTH Royal Institute of Technology,Materialfysik, MF(Swepub:kth)u1dg6qtm (author)
  • KTH Royal Institute of TechnologyMaterialfysik, MF (creator_code:org_t)

Related titles

  • In:Journal of Physical Chemistry C: American Chemical Society (ACS)121:43, s. 24011-240241932-74471932-7455

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