WFRF:(Zhou Zhe)
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| Fältnamn | Indikatorer | Metadata |
|---|---|---|
| 000 | 02862naa a2200445 4500 | |
| 001 | oai:DiVA.org:su-57880 | |
| 003 | SwePub | |
| 008 | 110523s2008 | |||||||||||000 ||eng| | |
| 009 | oai:DiVA.org:kth-89040 | |
| 024 | 7 | a https://urn.kb.se/resolve?urn=urn:nbn:se:su:diva-578802 URI |
| 024 | 7 | a https://doi.org/10.1016/j.tsf.2008.02.0422 DOI |
| 024 | 7 | a https://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-890402 URI |
| 040 | a (SwePub)sud (SwePub)kth | |
| 041 | a engb eng | |
| 042 | 9 SwePub | |
| 072 | 7 | a ref2 swepub-contenttype |
| 072 | 7 | a art2 swepub-publicationtype |
| 100 | 1 | a Zhou, Longjie4 aut |
| 245 | 1 0 | a Chemical bath deposition of thin TiO2-anatase films for dielectric applications |
| 264 | 1 | b Elsevier BV,c 2008 |
| 338 | a print2 rdacarrier | |
| 500 | a authorCount :5 | |
| 500 | a QC 20120217 | |
| 520 | a Titania thin films were prepared on bare Si and Pt/Ti/SiO2/Si substrates by chemical bath deposition (CBD) from solutions of a titanium peroxo complex and subsequent calcinations at 350 and 700 degrees C, respectively. The CBD process allowed deposition on both uncoated and metal-coated Si substrates with the same deposition rate. Optimization of the annealing process yielded uniform and crack-free nanocrystalline anatase films. The influence of the film thickness, irradiation of visible light, measuring frequency, temperature and substrate on the dielectric properties will be discussed in the paper. Films with a final thickness of about 600 nm showed comparably high relative permittivity of 31.8 on silicon and of 52.7 on Pt/Ti/SiO2/Si substrates, respectively. The present route provides anatase thin films with higher dielectric constants than classical sol-gel routes and is therefore a promising candidate for potential applications in large scale integration. | |
| 650 | 7 | a TEKNIK OCH TEKNOLOGIERx Materialteknikx Keramteknik0 (SwePub)205012 hsv//swe |
| 650 | 7 | a ENGINEERING AND TECHNOLOGYx Materials Engineeringx Ceramics0 (SwePub)205012 hsv//eng |
| 653 | a titanium oxide | |
| 653 | a dielectric properties | |
| 653 | a chemical bath deposition | |
| 653 | a NATURAL SCIENCES | |
| 653 | a NATURVETENSKAP | |
| 700 | 1 | a Hoffmann, Rudolf C.4 aut |
| 700 | 1 | a Zhao, Zheu Stockholms universitet,Avdelningen för materialkemi,Department of Physical Inorganic and Structural Chemistry, Stockholm University4 aut0 (Swepub:kth)u1qw3zev |
| 700 | 1 | a Bill, Joachim4 aut |
| 700 | 1 | a Aldinger, Fritz4 aut |
| 710 | 2 | a Stockholms universitetb Avdelningen för materialkemi4 org |
| 773 | 0 | t Thin Solid Filmsd : Elsevier BVg 516:21, s. 7661-7666q 516:21<7661-7666x 0040-6090x 1879-2731 |
| 856 | 4 8 | u https://urn.kb.se/resolve?urn=urn:nbn:se:su:diva-57880 |
| 856 | 4 8 | u https://doi.org/10.1016/j.tsf.2008.02.042 |
| 856 | 4 8 | u https://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-89040 |
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