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INFLUENCE OF DEPOSI...
INFLUENCE OF DEPOSITION CONDITIONS ON MICROSTRUCTURE AND TEXTURE OF Ti1-XAlXN PVD COATINGS
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- Pinchuk, Nataliia (författare)
- Karlstads universitet,Institutionen för ingenjörsvetenskap och fysik (from 2013)
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- Fallqvist, Mikael (författare)
- Karlstads universitet,Institutionen för ingenjörsvetenskap och fysik (from 2013)
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- Andersson, Jon M. (författare)
- Seco Tools AB, Sweden
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- Johansson-Jöesaar, Mats (författare)
- Seco Tools AB, Sweden
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- M’Saoubi, Rachid (författare)
- Seco Tools AB, Sweden
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- Krakhmalev, Pavel, Professor, 1973- (författare)
- Karlstads universitet,Institutionen för ingenjörsvetenskap och fysik (from 2013)
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(creator_code:org_t)
- TANGER Ltd. 2024
- 2024
- Engelska.
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Ingår i: NANOCON Conference Proceedings - International Conference on Nanomaterials. - : TANGER Ltd.. - 9788088365150 ; , s. 112-117
- Relaterad länk:
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https://doi.org/10.3...
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https://urn.kb.se/re...
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https://doi.org/10.3...
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Abstract
Ämnesord
Stäng
- This study is focused on how the application of pulsed substrate bias during cathodic arc deposition affects the microstructure, texture, grain size and phase composition of (Ti,Al)N coatings. A series of Tix-1AlxN, 0.25≤x≤0.55 coatings were deposited on WC-Co cemented carbide substrates with -30 V, -60 V and -300 V pulsing bias (duty cycle 10 % and a frequence of 1 kHz) under controlled chamber conditions at 4.5 Pa N2-gas and a substrate temperature about 400 °C. The pulsing parameters for the bias (voltage, duty cycle and frequency) were deliberately selected to influence structure, microstructure and composition of the deposited coatings. All Tix-1AlxN coatings had a consistent columnar cubic B1 structure regardless of their chemical composition. Coatings grown at -30 V and -60 V pulsed bias exhibited a pronounced <111> texture attributed to a kinetically driven mechanism influenced by the relative flux of ion species, affecting the surface migration of adatoms during growth. In contrast, the coatings grown with a pulsed bias of -300 V exhibited a reduced <111> texture and the onset of grains with <100> preferred orientation. The transition to the <100> orientation with increased ion energy agrees with the fact that the <111> directions expose the densest array of atoms to the ion beam during growth while the <100> are the most open channeling directions in a B1 structure. The correlation to the preferred with respect to pulsing conditions during growth, correlated to microstructure, grain size and phase composition be further discussed. Surface roughness was highest (Sa≈0.17-0.22 µm) for coating deposited at pulsed bias -30 V.
Ämnesord
- TEKNIK OCH TEKNOLOGIER -- Materialteknik -- Bearbetnings-, yt- och fogningsteknik (hsv//swe)
- ENGINEERING AND TECHNOLOGY -- Materials Engineering -- Manufacturing, Surface and Joining Technology (hsv//eng)
Nyckelord
- Aluminum coatings
- Aluminum compounds
- Carbides
- Cobalt compounds
- Grain size and shape; Ion beam assisted deposition
- Ion beams
- Ions
- Nanostructured materials
- Phase composition
- Structure (composition)
- Substrates
- Textures
- Titanium compounds
- Cathodic arc deposition
- Deposition conditions
- Duty-cycle
- Grainsize
- Microstructure-texture
- Pulsed bias
- Substrate bias
- Ti-Al-N
- Tix-1alxn coating
- WC Co cemented carbide substrate
- Surface roughness
- Maskinteknik
- Mechanical Engineering
- Materialteknik
- Materials Engineering
Publikations- och innehållstyp
- ref (ämneskategori)
- kon (ämneskategori)
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