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Sökning: L773:0884 2914 > (1995-1999) > Deposition and mech...

LIBRIS Formathandbok  (Information om MARC21)
FältnamnIndikatorerMetadata
00003080naa a2200289 4500
001oai:DiVA.org:liu-49783
003SwePub
008091011s1999 | |||||||||||000 ||eng|
024a https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-497832 URI
040 a (SwePub)liu
041 a engb eng
042 9 SwePub
072 7a ref2 swepub-contenttype
072 7a art2 swepub-publicationtype
100a Yashar, PCu Northwestern Univ, Dept Mat Sci & Engn, Evanston, IL 60208 USA Linkoping Univ, Dept Phys, Thin Film Phys Div, S-58183 Linkoping, Sweden Northwestern Univ, Adv Coatings Technol Grp, Evanston, IL 60201 USA4 aut
2451 0a Deposition and mechanical properties of polycrystalline Y2O3/ZrO2 superlattices
264 1c 1999
338 a print2 rdacarrier
520 a Polycrystalline Y2O3/ZrO2 superlattice thin films were deposited using opposed-cathode reactive magnetron sputtering. Pulsed direct-current power was used to eliminate arcing on the metallic targets. Radio-frequency power was applied to the substrates to achieve ion bombardment of the growing film. In order to reproducibly deposit at high rates in Ar-O-2 mixtures, the Y target voltage was used to indirectly feedback-control the O-2 partial pressure. Deposition rates as high as similar to 70% of the pure metal rates were achieved, typically 3.5 mu m/h. Superlattices with periods ranging from 2.6 to 95 nm were deposited. Y2O3 layer thicknesses were either 75% or 50% of the superlattice period. X-ray diffraction and transmission electron microscopy studies showed well-defined superlattice layers. The ZrO2 layers exhibited the high-temperature cubic-fluorite structure, which was epitaxially stabilized by the cubic Y2O3 layers, for thicknesses less than or equal to 7 nm. The equilibrium monoclinic structure was observed for thicker ZrO2 layers. Nanoindentation hardnesses ranged from 11.1 to 14.5 GPa with little dependence on period. The hardness results are discussed in terms of current superlattice hardening theories.
653 a TECHNOLOGY
653 a TEKNIKVETENSKAP
700a Barnett, SAu Northwestern Univ, Dept Mat Sci & Engn, Evanston, IL 60208 USA Linkoping Univ, Dept Phys, Thin Film Phys Div, S-58183 Linkoping, Sweden Northwestern Univ, Adv Coatings Technol Grp, Evanston, IL 60201 USA4 aut
700a Hultman, Larsu Linköpings universitet,Tekniska högskolan,Tunnfilmsfysik4 aut0 (Swepub:liu)larhu75
700a Sproul, WDu Northwestern Univ, Dept Mat Sci & Engn, Evanston, IL 60208 USA Linkoping Univ, Dept Phys, Thin Film Phys Div, S-58183 Linkoping, Sweden Northwestern Univ, Adv Coatings Technol Grp, Evanston, IL 60201 USA4 aut
710a Northwestern Univ, Dept Mat Sci & Engn, Evanston, IL 60208 USA Linkoping Univ, Dept Phys, Thin Film Phys Div, S-58183 Linkoping, Sweden Northwestern Univ, Adv Coatings Technol Grp, Evanston, IL 60201 USAb Tekniska högskolan4 org
773t Journal of Materials Researchg 14:9, s. 3614-3622q 14:9<3614-3622x 0884-2914x 2044-5326
8564 8u https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-49783

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Yashar, PC
Barnett, SA
Hultman, Lars
Sproul, WD
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Linköpings universitet

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