Determining role of W+ ions in the densification of TiAlWN thin films grown by hybrid HiPIMS/DCMS technique with no external heating

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Fältnamn	Indikatorer	Metadata
000		04435naa a2200337 4500
001		oai:DiVA.org:liu-191188
003		SwePub
008		230124s2023 \| \|\|\|\|\|\|\|\|\|\|\|000 \|\|eng\|
024	7	a https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-1911882 URI
024	7	a https://doi.org/10.1116/6.00023202 DOI
040		a (SwePub)liu
041		a engb eng
042		9 SwePub
072	7	a ref2 swepub-contenttype
072	7	a art2 swepub-publicationtype
100	1	a Li, Xiaou Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten4 aut0 (Swepub:liu)xiali37
245	1 0	a Determining role of W+ ions in the densification of TiAlWN thin films grown by hybrid HiPIMS/DCMS technique with no external heating
264	1	b A V S AMER INST PHYSICS,c 2023
338		a electronic2 rdacarrier
500		a Funding Agencies\|Swedish Research Council VR [2018-03957]; Swedish Energy Agency [51201-1]; Aforsk Foundation Grant [22-4]; Knut and Alice Wallenberg Foundation [KAW2016.0358, KAW2019.0290]; Carl Tryggers Stiftelse [CTS 20:150]; Competence Center Functional Nanoscale Materials (FunMat-II) VINNOVA Grant [2016-05156]; Swedish Research Council VR-RFI [2017-00646_9]; Swedish Foundation for Strategic Research [RIF14-0053]
520		a Hybrid high-power impulse and dc magnetron co-sputtering (HiPIMS/DCMS) with substrate bias synchronized to the high mass metal-ion fluxes was previously proposed as a solution to reduce energy consumption during physical vapor deposition processing and enable coatings on temperature-sensitive substrates. In this approach, no substrate heating is used (substrate temperature is lower than 150 C-o) and the thermally activated adatom mobility, necessary to grow dense films, is substituted by overlapping collision cascades induced by heavy ion bombardment and consisting predominantly of low-energy recoils. Here, we present direct evidence for the crucial role of W+ ion irradiation in the densification of Ti0.31Al0.60W0.09N films grown by the hybrid W-HiPIMS/TiAl-DCMS co-sputtering. The peak target current density J(max) on the W target is varied from 0.06 to 0.78 A/cm(2) resulting in more than fivefold increase in the number of W+ ions per deposited metal atom, eta = W+/(W + Al + Ti) determined by time-resolved ion mass spectrometry analyses performed at the substrate plane under conditions identical to those during film growth. The DCMS is adjusted appropriately to maintain the W content in the films constant at Ti0.31Al0.60W0.09N. The degree of porosity, assessed qualitatively from cross-sectional SEM images and quantitatively from oxygen concentration profiles as well as nanoindentation hardness, is a strong function of eta ( J m a x ). Layers grown with low eta values are porous and soft, while those deposited under conditions of high eta are dense and hard. Nanoindentation hardness of Ti0.31Al0.60W0.09N films with the highest density is & SIM;33 GPa, which is very similar to values reported for layers deposited at much higher temperatures (420-500 C-o) by conventional metal-ion-based techniques. These results prove that the hybrid HiPIMS/DCMS co-sputtering with bias pulses synchronized to high mass metal ion irradiation can be successfully used to replace conventional solutions. The large energy losses associated with heating of the entire vacuum chamber are avoided, by focusing the energy input to where it is in fact needed, i.e., the workpiece to be coated.
650	7	a NATURVETENSKAPx Kemix Oorganisk kemi0 (SwePub)104042 hsv//swe
650	7	a NATURAL SCIENCESx Chemical Sciencesx Inorganic Chemistry0 (SwePub)104042 hsv//eng
700	1	a Petrov, Ivanu Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten,Univ Illinois, IL 61801 USA4 aut0 (Swepub:liu)ivape26
700	1	a Hultman, Larsu Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten4 aut0 (Swepub:liu)larhu75
700	1	a Greczynski, Grzegorzu Linköpings universitet,Tunnfilmsfysik,Tekniska fakulteten4 aut0 (Swepub:liu)grzgr49
710	2	a Linköpings universitetb Tunnfilmsfysik4 org
773	0	t Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Filmsd : A V S AMER INST PHYSICSg 41:1q 41:1x 0734-2101x 1520-8559
856	4	u https://liu.diva-portal.org/smash/get/diva2:1730166/FULLTEXT01.pdfx primaryx Raw objecty fulltext:print
856	4 8	u https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-191188
856	4 8	u https://doi.org/10.1116/6.0002320

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Av författaren/redakt...: Li, Xiao; Petrov, Ivan; Hultman, Lars; Greczynski, Grze ...

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