Synthesis and characterization of nano-crystalline CVD diamond film on pure titanium using Ar/CH 4/H 2 gas mixture

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Askari, SJ (author): Department of High Tech Thin Films, School of Materials Science and Engineering, University of Science and Technology Beijing

Akhtar, Farid (author): Department of High Tech Thin Films, School of Materials Science and Engineering, University of Science and Technology Beijing

Chen, GC (author): Department of High Tech Thin Films, School of Materials Science and Engineering, University of Science and Technology Beijing

He, Q (author): Department of High Tech Thin Films, School of Materials Science and Engineering, University of Science and Technology Beijing

Wang, FY (author): Department of High Tech Thin Films, School of Materials Science and Engineering, University of Science and Technology Beijing

Meng, XM (author): Department of High Tech Thin Films, School of Materials Science and Engineering, University of Science and Technology Beijing

Lu, FX (author): Department of High Tech Thin Films, School of Materials Science and Engineering, University of Science and Technology Beijing

(creator_code:org_t)

Elsevier BV, 2007
2007
English.
In: Materials letters (General ed.). - : Elsevier BV. - 0167-577X .- 1873-4979. ; 61:11-12, s. 2139-2142

Related links:: https://urn.kb.se/re...; show more...; https://doi.org/10.1...; show less...

Abstract Subject headings

Titanium and Ti alloys have poor tribological properties and deposition of a well adherent diamond coating is a promising way to solve this problem. But diamond film deposition on pure titanium and Ti alloys is always difficult due to the high diffusion coefficient of carbon in Ti, the large mismatch in their thermal expansion coefficients, the complex nature of the interlayer formed during diamond deposition, and the difficulty of achieving very high nucleation density. A nano-crystalline diamond (NCD) film can resolve Ti and Ti alloys weak tribological performance due to its smooth surface. A well-adhered NCD film was successfully deposited on pure Ti substrate by using a microwave plasma assisted chemical vapor deposition (MWPCVD) system in the environment of Ar, CH4 and H2 gases at a moderate temperature. Detailed experimental results on the preparation, characterization and successful deposition of the NCD film on pure Ti are discussed

By the author/editor: Askari, SJ; Akhtar, Farid; Chen, GC; He, Q; Wang, FY; Meng, XM; show more...; Lu, FX; show less...

About the subject

ENGINEERING AND TECHNOLOGY: ENGINEERING AND ...; and Materials Engine ...; and Other Materials ...

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