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RF properties of carbon nanotube / Copper composite through silicon via based CPW structure for 3D integrated circuits

Nylander, Andreas, 1988 (author)
Chalmers tekniska högskola,Chalmers University of Technology
Bonmann, Marlene, 1988 (author)
Chalmers tekniska högskola,Chalmers University of Technology
Vorobiev, Andrei, 1963 (author)
Chalmers tekniska högskola,Chalmers University of Technology
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Hansson, Josef, 1991 (author)
Chalmers tekniska högskola,Chalmers University of Technology
Wang, Nan (author)
SHT Smart High-Tech AB
Fu, Yifeng, 1984 (author)
Chalmers tekniska högskola,Chalmers University of Technology
Liu, Johan, 1960 (author)
Chalmers tekniska högskola,Chalmers University of Technology
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 (creator_code:org_t)
2019
2019
English.
In: 2019 IEEE 14th Nanotechnology Materials and Devices Conference, NMDC 2019.
  • Conference paper (peer-reviewed)
Abstract Subject headings
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  • The development of integrated circuits (ICs) has seen exponential growth in performance over the last couple of decades and has pushed the boundaries for how we use our electronics in our daily lives. The scaling of ICs, and therefore also the performance development, is now starting to slow down when the physical designs are reaching critical dimensions where quantum effects starts to become noticeable. One proposed route to circumvent these issues for a continued scaling is based on the implementation of 3D integration by chip stacking for an increased miniaturization potential. Miniaturisation will soon also result in interconnect dimensions that surpass the mean free path (MFP) in Cu, the commonly used material for interconnects today, with a sharp increase in resistivity as a result. By changing the through silicon via (TSV) interconnect material from Cu to a carbon nanotube (CNT)/Cu composite, continued scaling can be ensured both in terms of electrical conductivity, ampacity and signal delays. Furthermore, a reduced skin effect can be achieved ensuring lower signal losses at higher RF frequencies making the CNT/Cu composite an ideal candidate to replace tranditional Cu interconnects. In this paper, we are demonstrating a coplanar waveguide (CPW) test structure using CNT/Cu filled TSVs connected to Au transmission lines on SiO2-passivated high resistivity Si substrates. The parasitic losses of the CNT/Cu TSV based CPW test structure were measured using a Sparameters test setup. The results showed that the CNT/Cu TSVs with affiliated contacts increased the signal losses up to S21 = -5.5 dB compared to Au reference transmission lines. These results are in line with previous results using CNT based TSVs and will serve as a basis for future improvements of CNT based interconnect technology for 3D integration.

Subject headings

TEKNIK OCH TEKNOLOGIER  -- Materialteknik (hsv//swe)
ENGINEERING AND TECHNOLOGY  -- Materials Engineering (hsv//eng)
TEKNIK OCH TEKNOLOGIER  -- Nanoteknik (hsv//swe)
ENGINEERING AND TECHNOLOGY  -- Nano-technology (hsv//eng)

Keyword

Carbon nanotube/copper composite through silicon vias
3D integration
RF measurement

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Nylander, Andrea ...
Bonmann, Marlene ...
Vorobiev, Andrei ...
Hansson, Josef, ...
Wang, Nan
Fu, Yifeng, 1984
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Liu, Johan, 1960
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ENGINEERING AND TECHNOLOGY
ENGINEERING AND ...
and Materials Engine ...
ENGINEERING AND TECHNOLOGY
ENGINEERING AND ...
and Nano technology
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Chalmers University of Technology

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