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Graphene transparent electrodes grown by rapid chemical vapor deposition with ultrathin indium tin oxide contact layers for GaN light emitting diodes

Xu, K. (author)
Xu, C. (author)
Deng, J. (author)
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Zhu, Y. X. (author)
Guo, W. L. (author)
Mao, M. M. (author)
Zheng, L. (author)
Sun, Jie, 1977 (author)
Chalmers tekniska högskola,Chalmers University of Technology
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 (creator_code:org_t)
AIP Publishing, 2013
2013
English.
In: Applied Physics Letters. - : AIP Publishing. - 0003-6951 .- 1077-3118. ; 102:16
  • Journal article (peer-reviewed)
Abstract Subject headings
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  • By virtue of the small active volume around Cu catalyst, graphene is synthesized by fast chemical vapor deposition (CVD) in a cold wall vertical system. Despite being highly polycrystalline, it is as conductive and transparent as standard graphene and can be used in light emitting diodes as transparent electrodes. 7-10 nm indium tin oxide (ITO) contact layer is inserted between the graphene and p-GaN to enhance hole injection. Devices with forward voltage and transparency comparable to those using traditional 240 nm ITO are achieved with better ultraviolet performances, hinting the promising future for application-oriented graphene by rapid CVD.

Subject headings

NATURVETENSKAP  -- Fysik -- Subatomär fysik (hsv//swe)
NATURAL SCIENCES  -- Physical Sciences -- Subatomic Physics (hsv//eng)

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